Thin Film Deposition
MFA, KFKI Campus, Building 26.
Contact: György Radnóczi, radnoczi.gyorgy @

DC Sputtering

DC sputtering unit

Research fields:
– growth of metallic and alloy films and nanoparticles
– growth of coatings (e.g. carbon-metal nanocomposites)
– reactive sputtering and growth of nitride and oxide (TiN AlN, AlNxOy) coatings

Background vacuum: down to (2-3)×10-8 mbar
Sputtering pressure: ~2×10-3 mbar
Two 2” AJA DC magnetrons directed to one focal point
Load lock system
Rotating substrate holder with heating stage